Ultra-high purity: The molybdenum content in pure molybdenum targets is usually not less than 99.97%. High purity can reduce the occurrence of abnormal particles during PVD and improve the performance of sputtered films.
Ultra-high density: Almost 100% density can be achieved through large rolling deformation, with a density of up to 10.2g/cm³, which can improve sputtering efficiency and avoid particle splashing.
Fine and uniform grain size: It can make the sputtering rate faster and the thickness of the deposited film more uniform.
Classified by shape: molybdenum square targets, molybdenum strip targets, molybdenum tube targets, etc.
Classified by material: pure molybdenum targets and molybdenum alloy targets.
They are mainly used to form molybdenum coatings on various substrates and are widely applied in electronic components and electronic products.
Flat panel displays: Molybdenum coatings are part of the thin-film transistors in TFT-LCD screens.
CIGS solar cells: Can be used as electrode and wiring materials.
Semiconductor field: Can be used to form diffusion barrier layers, etc.
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